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Second Annual MG Exhibit Design Excellence Scholarship Winner Announced

Apr 07, 2014
Ben Olson
Second Annual MG Exhibit Design Excellence  Scholarship Winner Announced

Exhibitor2014 MG Design announced the winner of its second annual scholarship which drew applications from students. The Scholarship Program, now entering its third year, was created in honor of MG Founder Michael Grivas Sr., who was a talented designer, industrious entrepreneur and industry visionary. The 2014 scholarship recipient is NaYoung Kang, a graduate student at the Fashion Institute of Technology (FIT).  

NaYoung Kang, Fashion Institute of Technology

Kang, who will receive her Master’s in Exhibition Design from FIT in June 2014, stood out from a competitive field of scholarship entrants thanks to her design portfolio and experience. In her submission, Kang’s words echo MG’s process and commitment: “An exhibit designer needs to constantly make an effort to grow and be better than his or her prior works. A designer can achieve the best result of his or her project through understanding audiences, testing and sharing the ideas, having diverse experiences and good time management. I am always trying to improve all my skills for creating a good design.”

Associate Professor Brenda Cowan, Chair of FIT’s Graduate Exhibition Design program, shared: “A student of exhibition design should embody the knowledge that exhibitions are informational experiences created for and driven by audiences, and that to be an exhibition designer is to be a storyteller. They should complete their education with strong technical achievement, leadership and innovation in mind, and as someone who sees themselves as a steward of the profession. NaYoung possesses these attributes and it has been a pleasure seeing her grow and come into her own with each new project.”

The Michael Grivas Sr. Exhibit Design Excellence ™ Scholarship program is an annual scholarship awarded to an exemplary student seeking a degree in an exhibit design-related field.  To be considered, applicants must:


  • Be at least a junior currently attending an accredited U.S. post-secondary institution seeking a Bachelor’s degree in an exhibit design-related field or a graduate student in a Master’s degree program in an exhibit-design related field
  • Have a cumulative grade point average of 3.2 or higher at the time of application
  • Demonstrate traits of leadership, excellence and creativity


Scholarship applications for the next school year will be available by May 15 at

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